Argon Gas Purifier DAGP-4C
It can purify the ordinary pure argon to be high-purity argon gas, widely used in electronics,metallurgy, machinery, chemical, atomic energy and other economic sectors, provide high-purity argon gas for spectral analysis and scientific research.
Feature
- High catalytic activity, huge adsorption quantity, low working temperature, efficient device.
- Renewable type, can be used repeatedly for a long time.
- Reuse without hydrogen and vacuum but with the few argon, safe and reliable.
- The valve are all stainless bellows type, without leakage.
- Double structures. One group works while the other group is reserved, long gas supplying system.
- Belongs to one-time investment, without consumables .
Specification :
| Model | DAGP-4C | |
| Original Gas Demand | Purity | ≥ 99.9% |
| Impurity Content | O2<1000ppm;H2O<1000ppm | |
| Output Gas Purity | Purity | ≥ 99.999% |
| Impurity content | O2≤0.5PPm；H2O≤1PPm(Dew point≤-76℃)； CO+CO2≤0.1PPm；S,P Oxides≤0.1PPm； Number of dust particles(≥0.3μm)3-5s/L； | |
| Operating Pressure | ≤ 0.8MPa | |
| Max Flow Rate | ≤ 60L/min | |
| Flow Rate Of Regenerating Argon | 500 ml/min | |
| Regenerating Temperature Of The Absorber | 400±20℃ | |
| Work Temperature Of The Reactor | 300±20℃ | |
| Optional Accessory | N2 removal tower | |
| Power Supply | AC220V/110V±10%,50/60Hz; | |
| Consumption | 1600W | |
| External size (W*D*H) mm | 420*600*1230 | |
| Package size (W*D*H) mm | 510*710*1300 | |
| Net weight(kg) | 135 | |
Ultra-High-Purity Argon Delivery with the Argon Gas Purifier DAGP-4C
Ensure contamination-free inert atmospheres for sensitive analytical and industrial processes with the Argon Gas Purifier DAGP-4C—a high-efficiency, dual-stage purification system engineered to remove oxygen, moisture, and hydrocarbons from commercial-grade argon gas. Designed for use with ICP-MS, GC-MS, semiconductor manufacturing, laser systems, and glovebox environments, the DAGP-4C delivers argon purity up to 99.9999% (6N), protecting instrumentation and ensuring data integrity.
Engineered for Maximum Gas Purity and Process Reliability
The DAGP-4C Argon Gas Purifier features a multi-media cartridge system combining oxygen scavengers, molecular sieves, and hydrocarbon traps in a temperature-controlled, stainless-steel housing. It reduces impurities to sub-ppb levels:
O₂: <10 ppb
H₂O: <10 ppb
Total Hydrocarbons: <5 ppb
With a flow rate capacity of up to 10 L/min and inlet pressure regulation (0–150 psi), the DAGP-4C integrates seamlessly into existing gas lines without disrupting workflow.
- Dual-Stage Purification Cartridge – Simultaneously removes O₂, H₂O, and hydrocarbons in a single pass.
- Real-Time Purity Monitoring (Optional) – Integrated oxygen/moisture sensors with digital readout and alarms.
- Stainless Steel Construction – Electropolished 316L tubing and VCR/VCO fittings prevent outgassing and leaks.
- Long Service Life – Cartridge lasts 6–24 months depending on gas quality and usage; easy field replacement.
- Compact Benchtop or Wall-Mount Design – Saves lab space; includes mounting brackets and pressure gauges.
- CE & RoHS Certified – Complies with international safety and environmental standards.
Trusted in High-Sensitivity Analytical and Industrial Applications
Impurities in argon gas can cause plasma instability in ICP-MS, baseline drift in GC-MS, oxidation in semiconductor deposition, or reduced laser efficiency. The DAGP-4C eliminates these risks by delivering ultra-pure argon directly at the point of use—reducing downtime, extending consumable life, and improving result reproducibility.
Whether you’re running trace metal analysis, maintaining an inert glovebox, or supporting advanced materials research, the Argon Gas Purifier DAGP-4C ensures your processes operate at peak performance with confidence.
Purity you can trust. Performance you can rely on.
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